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Proceedings Paper

High frequency binary amorphous silicon grating working as wire grid polarizer for UV applications
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Paper Abstract

In this work we present a wire grid polarizer with a working range down to 300 nm based on an amorphous silicon grating. For the fabrication of gratings with periods of 120 nm and 140 nm electron beam lithography and ICP etching were used. Furthermore the influence of the grating period on the optical properties was investigated. The measured maximum value of the extinction ratio for a period of 140 nm and 120 nm is 177 at a wavelength of 418 nm and 324 at a wavelength of 394 nm, respectively.

Paper Details

Date Published: 23 February 2012
PDF: 6 pages
Proc. SPIE 8270, High Contrast Metastructures, 82700F (23 February 2012); doi: 10.1117/12.906618
Show Author Affiliations
Thomas Weber, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Thomas Käsebier, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Stefanie Kroker, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Andreas Tünnermann, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 8270:
High Contrast Metastructures
Connie J. Chang-Hasnain; Fumio Koyama; Alan Eli Willner; Weimin Zhou, Editor(s)

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