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Proceedings Paper

Performance evaluation of direct laser lithography system for rotationally symmetric diffractive optical elements
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Paper Abstract

We have developed a direct laser lithography system for fabrication of precision diffractive optical elements such as Fresnel zone plates and computer-generated holograms. The developed lithography system has possible working area up to 360 mm and minimum linewidth of 0.5 μm. To assure the performance of the lithography system, the performance evaluation was carried out on the moving stages, the writing head module, and the light source, respectively. In this paper, we report the performance evaluation including the standard uncertainties of each part, the combined standard uncertainty, and finally the expanded uncertainty to give a particular level of confidence.

Paper Details

Date Published: 15 February 2012
PDF: 7 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82491C (15 February 2012); doi: 10.1117/12.906548
Show Author Affiliations
Dong-Ik Kim, Korea Basic Science Institute (Korea, Republic of)
Hyug-Gyo Rhee, Korea Research Institute of Standards and Science (Korea, Republic of)
Geon Hee Kim, Korea Basic Science Institute (Korea, Republic of)


Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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