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Proceedings Paper

Frequency doubled high-power disk lasers in pulsed and continuous-wave operation
Author(s): Sascha Weiler; Alexander Hangst; Christian Stolzenburg; Ivo Zawischa; Dirk Sutter; Alexander Killi; Steffen Kalfhues; Uwe Kriegshaeuser; Marco Holzer; David Havrilla
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Paper Abstract

The disk laser with multi-kW output power in infrared cw operation is widely used in today's manufacturing, primarily in the automotive industry. The disk technology combines high power (average and/or peak power), excellent beam quality, high efficiency and high reliability with low investment and operating costs. Additionally, the disk laser is ideally suited for frequency conversion due to its polarized output with negligible depolarization losses. Laser light in the green spectral range (~515 nm) can be created with a nonlinear crystal. Pulsed disk lasers with green output of well above 50 W (extracavity doubling) in the ps regime and several hundreds of Watts in the ns regime with intracavity doubling are already commercially available whereas intracavity doubled disk lasers in continuous wave operation with greater than 250 W output are in test phase. In both operating modes (pulsed and cw) the frequency doubled disk laser offers advantages in existing and new applications. Copper welding for example is said to show much higher process reliability with green laser light due to its higher absorption in comparison to the infrared. This improvement has the potential to be very beneficial for the automotive industry's move to electrical vehicles which requires reliable high-volume welding of copper as a major task for electro motors, batteries, etc.

Paper Details

Date Published: 6 February 2012
PDF: 8 pages
Proc. SPIE 8239, High Power Laser Materials Processing: Lasers, Beam Delivery, Diagnostics, and Applications, 823907 (6 February 2012); doi: 10.1117/12.906540
Show Author Affiliations
Sascha Weiler, TRUMPF Inc. (United States)
Alexander Hangst, TRUMPF Laser GmbH & Co. KG (Germany)
Christian Stolzenburg, TRUMPF Laser GmbH & Co. KG (Germany)
Ivo Zawischa, TRUMPF Laser GmbH & Co. KG (Germany)
Dirk Sutter, TRUMPF Laser GmbH & Co. KG (Germany)
Alexander Killi, TRUMPF Laser GmbH & Co. KG (Germany)
Steffen Kalfhues, TRUMPF Laser GmbH & Co. KG (Germany)
Uwe Kriegshaeuser, TRUMPF Laser- und Systemtechnik GmbH (Germany)
Marco Holzer, TRUMPF Laser- und Systemtechnik GmbH (Germany)
David Havrilla, TRUMPF Inc. (United States)

Published in SPIE Proceedings Vol. 8239:
High Power Laser Materials Processing: Lasers, Beam Delivery, Diagnostics, and Applications
Eckhard Beyer; Timothy Morris, Editor(s)

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