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Proceedings Paper

Calculation of duty cycle of beam sampling grating mask and analysis on diffraction efficiency uniformity of beam sampling grating
Author(s): Xiaobin Xia; Xinrong Chen; Jianhong Wu
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Paper Abstract

Cr mask is applied to fabricate beam sampling gratings (BSG) used in inertial confinement fusion (ICF). There are requirements on both first-order average diffraction efficiency and uniformity diffraction efficiency of BSG, so duty cycles of Cr mask grating must be measured to analyze the diffraction performance. The special Cr mask is one kind of grating with curved fringes and differing periods. In this paper, a method which can calculate duty cycles of Cr mask by measuring the zeroth-order diffraction efficiency is introduced. Based on rigorous coupled wave analysis (RCWA) theory, this method takes curved fringes as straight, and then calculates duty cycles under certain diffraction efficiencies by using the drawing of the change of diffraction efficiencies against the change of duty cycles and periods. A duty cycle can be found at a very diffraction efficiency and period. With duty cycles obtained, average diffraction efficiency and diffraction efficiency RMS can be calculated at certain etch depth. Also an example is given.

Paper Details

Date Published: 28 November 2011
PDF: 7 pages
Proc. SPIE 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology, 82020Z (28 November 2011); doi: 10.1117/12.906516
Show Author Affiliations
Xiaobin Xia, Soochow Univ. (China)
Xinrong Chen, Soochow Univ. (China)
Jianhong Wu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 8202:
2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology
Hoi Sing Kwok; Fengzhou Fang; Lian Xiang Yang; Chongxiu Yu; Albert A. Weckenmann; Yanbing Hou; Jinxue Wang; Ji Zhao; Jinxue Wang; Peter Zeppenfeld; Boyu Ding; Boyu Ding; Liquan Dong; Liquan Dong; Jack K. Luo; Boyu Ding; Liquan Dong; Jinxue Wang, Editor(s)

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