Share Email Print
cover

Proceedings Paper

Use of ALD thin film Bragg mirror stacks in tuneable visible light MEMS Fabry-Perot interferometers
Author(s): Anna Rissanen; Riikka L. Puurunen
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper discusses the use of ALD thin films as Bragg mirror structure materials in MEMS Fabry-Perot interferometers in the visible spectral range. Utilizing polyimide sacrificial layer in the FPI fabrication process is also presented as an alternative method to allow higher temperature (T= 300 °C) ALD FPI processing. ALD Al2O3 and TiO2 thin films grown at T= 110 °C are optically characterized to determine their performance in the UV - visible range (λ>200nm) and effects of the ALD temperature on the thin film stacks and the FPI process is discussed. Optically simulated 5-layer Bragg mirror stacks consisting of ALD Al2O3 and TiO2 for wavelengths between 420 nm and 1000 nm are presented and corresponding MEMS mirror membrane structures are fabricated at T= 110 °C and tested for their release yield properties. As a result, the applicable wavelength range of the low-temperature ALD FPI technology can be defined.

Paper Details

Date Published: 14 February 2012
PDF: 9 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82491A (14 February 2012); doi: 10.1117/12.905084
Show Author Affiliations
Anna Rissanen, VTT Technical Research Ctr. of Finland (Finland)
Riikka L. Puurunen, VTT Technical Research Ctr. of Finland (Finland)


Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

© SPIE. Terms of Use
Back to Top