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Proceedings Paper

Surface plasmon polaritions excitation by radially polarized vortex beams
Author(s): Wenjun Gu; Zhehai Zhou; Qiaofeng Tan
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Paper Abstract

In the past several years, surface plasmon polaritons (SPPs) excitation by vector beams or vortex beams has been greatly studied, and many significant achievements have been obtained, which show wide applications in near-field optics. In the paper, we study SPPs excited by radially polarized vortex beams, and concentrate on the influence of the phase distribution of vortex beams to SPP field distribution. Based on the vector diffraction theory, the expressions for SPP fields excited by radially polarized vortex beams are derived, and the orbital angular momentum (OAM) is calculated. We numerically simulate the intensity and phase distributions of SPP fields excited by radially polarized vortex beams with different topological charges, and analyze the corresponding orbital angular momentum (OAM). The results show that by changing the topological charge, we can flexibly modulate the intensity and phase distribution, and control the OAM, which presents us with more useful applications in special fields, such as optical trapping, near-field optical devices, particles rotation, and so forth.

Paper Details

Date Published: 29 November 2011
PDF: 8 pages
Proc. SPIE 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology, 82020W (29 November 2011); doi: 10.1117/12.904899
Show Author Affiliations
Wenjun Gu, Tsinghua Univ. (China)
Zhehai Zhou, Beijing Information Science and Technology Univ. (China)
Qiaofeng Tan, Tsinghua Univ. (China)


Published in SPIE Proceedings Vol. 8202:
2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology
Hoi Sing Kwok; Yanbing Hou; Jinxue Wang; Boyu Ding; Liquan Dong; Fengzhou Fang; Albert A. Weckenmann; Ji Zhao; Peter Zeppenfeld; Jack K. Luo; Boyu Ding; Liquan Dong; Jinxue Wang; Lian Xiang Yang; Chongxiu Yu; Jinxue Wang; Boyu Ding; Liquan Dong, Editor(s)

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