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Proceedings Paper

The application of DOE in uniform illumination for large area digital speckle pattern interferometry
Author(s): Zhanhua Huang; Meng You; Huaiyu Cai; Meng Zhu
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Paper Abstract

Uniform illumination plays an important role in Digital Speckle Pattern Interferometry (DSPI) of measuring a large object. This paper presents a method that by designing a specified DOE with certain algorithm in front of laser diodes, a large and uniform illumination could be achieved at the designed distance. The fluctuation of no more than 10% has been analyzed for its influence on interferogram. Only 6 semiconductor lasers are necessary in the interferometer to lighting its view in theory and the experiment with the simulated illumination has been done. The fringes of deformation at different parts of the object show that this method is suitable for large area detection.

Paper Details

Date Published: 29 November 2011
PDF: 7 pages
Proc. SPIE 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology, 820209 (29 November 2011); doi: 10.1117/12.903997
Show Author Affiliations
Zhanhua Huang, Tianjin Univ. (China)
Meng You, Tianjin Univ. (China)
Huaiyu Cai, Tianjin Univ. (China)
Meng Zhu, Tianjin Univ. (China)


Published in SPIE Proceedings Vol. 8202:
2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology
Hoi Sing Kwok; Fengzhou Fang; Lian Xiang Yang; Chongxiu Yu; Albert A. Weckenmann; Yanbing Hou; Jinxue Wang; Ji Zhao; Jinxue Wang; Peter Zeppenfeld; Boyu Ding; Boyu Ding; Liquan Dong; Liquan Dong; Jack K. Luo; Boyu Ding; Liquan Dong; Jinxue Wang, Editor(s)

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