Share Email Print
cover

Proceedings Paper

Study of combined filter based on wavelet transform to denoise stripe images of electronic speckle shearography pattern interferometry
Author(s): Zhongling Liu; Chao Jing; Yimo Zhang
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Stripe images of electronic speckle shearography pattern interferometry, in which stripe distribution are correlated with vertical micro distortion or micro vibration of objects, are severely disturbed by noises, and so denoising stripe images of electronic speckle shearography pattern interferometry is necessary to extract useful stripe distribution information. Denoising methods and flow for stripe images of electronic speckle shearography pattern interferometry are analyzed in this paper to get the stripe distribution correlated with vertical micro distortion or micro vibration of objects. The noises in the stripe images of electronic speckle shearography pattern interferometry are comprised of speckle noise and other random noises induced by environmental disturb and instrumental performance, so it's difficult to use familiar filters, such as mean-value filter, medium-value filter and adaptive filter, etc, to remove all noises in the stripe images. The combined filter composed of mean-value filter and wavelet filter is designed to denoise stripe images. The aim of mean-value filter is to remove random noises induced by environmental disturb and instrumental performance, and then the wavelet filter, in which the Meyer wavelet is adopted, is designed to remove speckle noise in the stripe images. The final stripe distribution images after denoising and binarization are listed to prove the denoising validity of combined filter based on wavelet transform.

Paper Details

Date Published: 29 November 2011
PDF: 10 pages
Proc. SPIE 8200, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Processing Technology, 82000Q (29 November 2011); doi: 10.1117/12.902739
Show Author Affiliations
Zhongling Liu, Beijing Institute of Technology (China)
Science and Technology on Optical Radiation Lab. (China)
Chao Jing, Science and Technology on Optical Radiation Lab. (China)
Yimo Zhang, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 8200:
2011 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Processing Technology
Toru Yoshizawa; Ping Wei; Jesse Zheng, Editor(s)

© SPIE. Terms of Use
Back to Top