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Proceedings Paper

The modulated photocurrent of amorphous HgCdTe thin films
Author(s): Lianjie Yu; Yanli Shi; Jisheng Zhuang; Xiongjun Li; Gongrong Deng; Lili Yang; Wenjin He
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Paper Abstract

Amorphous HgCdTe thin films were deposited on quartz substrate by RF magnetron sputtering technique. The modulated photocurrent(MPC) of amorphous HgCdTe thin films has been investigated as a function of temperature T, the excitation light intensity F, and applied electric fields EB. The results indicated that the modulated photocurrent show an activated behavior in the range of 80K-300K. The activated energy ΔEap of the modulated photocurrent was found to strongly depend on temperature, whereas it is nearly independent of the applied electric field. The exponent γ in the power law relationship (IpFγ) between excitation light intensity F and modulated photocurrent of amorphous HgCdTe thin films was obtained at different temperature. The γ depends strongly on the temperature T, but it is independence of applied electric fields EB. The values of exponent γ of amorphous HgCdTe thin films lie between 0.5 and 1.0. The results indicated a continuous distribution of localized states exists in amorphous HgCdTe thin films.

Paper Details

Date Published: 8 September 2011
PDF: 6 pages
Proc. SPIE 8193, International Symposium on Photoelectronic Detection and Imaging 2011: Advances in Infrared Imaging and Applications, 819341 (8 September 2011); doi: 10.1117/12.900987
Show Author Affiliations
Lianjie Yu, Kunming Institute of Physics (China)
Yanli Shi, Kunming Institute of Physics (China)
Jisheng Zhuang, Kunming Institute of Physics (China)
Xiongjun Li, Kunming Institute of Physics (China)
Gongrong Deng, Kunming Institute of Physics (China)
Lili Yang, Kunming Institute of Physics (China)
Wenjin He, Kunming Institute of Physics (China)


Published in SPIE Proceedings Vol. 8193:
International Symposium on Photoelectronic Detection and Imaging 2011: Advances in Infrared Imaging and Applications
Jeffery J. Puschell; Junhao Chu; Haimei Gong; Jin Lu, Editor(s)

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