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Proceedings Paper

Study of SF6 gas decomposition products based on spectroscopy technology
Author(s): Ji-xing Cai; Yan-xiang Na; Wei-yuan Ni; Guo-wei Li; Ke-cheng Feng; Gui-cai Song
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Paper Abstract

With the rapid development of power industry, the number of SF6 electrical equipment are increasing, it has gradually replaced the traditional insulating oil material as insulation and arc media in the high-voltage electrical equipment. Pure SF6 gas has excellent insulating properties and arc characteristics; however, under the effect of the strong arc, SF6 gas will decompose and generate toxic substances, then corroding electrical equipment, thereby affecting the insulation and arc ability of electrical equipment. If excessive levels of impurities in the gas that will seriously affect the mechanical properties, breaking performance and electrical performance of electrical equipment, it will cause many serious consequences, even threaten the safe operation of the grid. This paper main analyzes the basic properties of SF6 gas and the basic situation of decomposition in the discharge conditions, in order to simulate the actual high-voltage electrical equipment, designed and produced a simulation device that can simulate the decomposition of SF6 gas under a high voltage discharge, and using fourier transform infrared spectroscopy to analyze the sample that produced by the simulation device. The result show that the main discharge decomposition product is SO2F2 (sulfuryl fluoride), the substance can react with water and generate corrosive H2SO4(sulfuric acid) and HF (hydrogen fluoride), also found that the increase in the number with the discharge, SO2F2concentration levels are on the rise. Therefore, the material can be used as one of the main characteristic gases to determine the SF6 electrical equipment failure, and to monitor their concentration levels.

Paper Details

Date Published: 8 September 2011
PDF: 7 pages
Proc. SPIE 8193, International Symposium on Photoelectronic Detection and Imaging 2011: Advances in Infrared Imaging and Applications, 81932K (8 September 2011); doi: 10.1117/12.900483
Show Author Affiliations
Ji-xing Cai, Changchun Univ. of Science and Technology (China)
Yan-xiang Na, Changchun Univ. of Science and Technology (China)
Wei-yuan Ni, Changchun Univ. of Science and Technology (China)
Guo-wei Li, Changchun Univ. of Science and Technology (China)
Ke-cheng Feng, Changchun Univ. of Science and Technology (China)
Gui-cai Song, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 8193:
International Symposium on Photoelectronic Detection and Imaging 2011: Advances in Infrared Imaging and Applications
Jeffery J. Puschell; Junhao Chu; Haimei Gong; Jin Lu, Editor(s)

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