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Proceedings Paper

Mask blank material optimization impact on leading-edge ArF lithography
Author(s): Kei Mesuda
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Paper Details

Date Published:
Proc. SPIE 8166, Photomask Technology 2011, 816602; doi: 10.1117/12.900012
Show Author Affiliations
Kei Mesuda, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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