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Proceedings Paper

CD-Metrology of EUV Masks in the Presence of Charging: Measurement and Simulation
Author(s): Sergey V. Babin
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Proc. SPIE 8081, Photomask and Next-Generation Lithography Mask Technology XVIII, 80810C; doi: 10.1117/12.899912
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Sergey V. Babin, Abeam Technologies (United States)


Published in SPIE Proceedings Vol. 8081:
Photomask and Next-Generation Lithography Mask Technology XVIII

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