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Proceedings Paper

RegC: a new registration control process for photomasks after pattern generation
Author(s): Erez Graitzer; Guy Ben-Zvi; Avi Cohen; Dmitriev Vladimir; Dan Avizemer
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Paper Abstract

As the lithography roadmap unfolds on its path towards ever smaller geometries, the pattern placement (Registration) requirements are increasing dramatically. This trend is further enhanced by anticipating the impact of innovative process solutions as double patterning where mask to mask overlay on the wafer is heavily influenced by mask registration error. In previous work1 a laser based registration control (RegC) process in the mask periphery (outside the exposure field) was presented. While providing a fast and effective improvement of registration, the limitation of writing with the laser outside of the active area limits the registration improvement to ~25%. The periphery process can be applied after the pattern generation or after pellicle mounting and allows fine tuning of the mask registration. In this work we will show registration correction results where the full mask area is being processed. While processing inside the exposure field it is required to maintain the CD Uniformity (CDU) neutral .In order to maintain the CDU neutral several different laser writing steps are utilized. A special algorithm and software were developed in order to compute the process steps required for maintaining the CDU neutral from one side while correcting for mask placement errors on the other side. By applying the correction process inside the active area improvements of up to 50% of the 3S registration and values as low as 3 nm 3S after scale and ortho correction have been achieved. These registration improvements have been achieved while maintaining the CDU signature of the mask as measured by areal imaging with WLCDTM (Wafer Level CD Metrology tool from Carl Zeiss SMS).

Paper Details

Date Published: 19 May 2011
PDF: 11 pages
Proc. SPIE 8081, Photomask and Next-Generation Lithography Mask Technology XVIII, 80810V (19 May 2011); doi: 10.1117/12.899904
Show Author Affiliations
Erez Graitzer, Carl Zeiss SMS Ltd. (Israel)
Guy Ben-Zvi, Carl Zeiss SMS Ltd. (Israel)
Avi Cohen, Carl Zeiss SMS Ltd. (Israel)
Dmitriev Vladimir, Carl Zeiss SMS Ltd. (Israel)
Dan Avizemer, Carl Zeiss SMS Ltd. (Israel)

Published in SPIE Proceedings Vol. 8081:
Photomask and Next-Generation Lithography Mask Technology XVIII
Toshio Konishi, Editor(s)

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