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Proceedings Paper

Calibration of diffractive micromirror arrays for microscopy applications
Author(s): Dirk Berndt; Jörg Heber; Steffen Sinning; Dirk Rudloff; Steffen Wolschke; Mark Eckert; Jan-Uwe Schmidt; Martin Bring; Michael Wagner; Hubert Lakner
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Paper Abstract

We report on our investigation to precisely actuate diffractive micromirror arrays (MMA) with an accuracy of λ/100. The test samples consist of analog, torsional MEMS arrays with 65 536 (256x256) mirror elements. These light modulators were developed for structured illumination purposes to be applied as programmable mask for life science and semiconductor microscopy application. Main part of the work relies on the well known characterization of MEMS mirrors with profilometry to automatically measure and approximate the MMA actuation state with high resolution. Examples illustrate the potential of this strategy to control the tilt state of many thousand micromirrors within the accuracy range of the characterization tool. In a dynamic range between 0 and >250 nm the MMA deflection has been precisely adjusted for final MMA application in the deep-UV - VIS - NIR spectral range. The optical properties of calibrated MMAs are tested in a laser measurement setup. After MMA calibration an increased homogeneity and improved image contrast are demonstrated for various illumination patterns.

Paper Details

Date Published: 8 September 2011
PDF: 10 pages
Proc. SPIE 8191, International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, 81910O (8 September 2011); doi: 10.1117/12.899881
Show Author Affiliations
Dirk Berndt, Fraunhofer Institute for Photonic Microsystems (Germany)
Jörg Heber, Fraunhofer Institute for Photonic Microsystems (Germany)
Steffen Sinning, Fraunhofer Institute for Photonic Microsystems (Germany)
Dirk Rudloff, Fraunhofer Institute for Photonic Microsystems (Germany)
Steffen Wolschke, Fraunhofer Institute for Photonic Microsystems (Germany)
Mark Eckert, Fraunhofer Institute for Photonic Microsystems (Germany)
Jan-Uwe Schmidt, Fraunhofer Institute for Photonic Microsystems (Germany)
Martin Bring, Fraunhofer Institute for Photonic Microsystems (Germany)
Michael Wagner, Fraunhofer Institute for Photonic Microsystems (Germany)
Hubert Lakner, Fraunhofer Institute for Photonic Microsystems (Germany)


Published in SPIE Proceedings Vol. 8191:
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies
Yuelin Wang; Huikai Xie; Yufeng Jin, Editor(s)

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