Share Email Print
cover

Proceedings Paper

In-die job automation for PROVE
Author(s): Ronald J. Lesnick; Stephen Kim; Matthias Waechter; Dirk Seidel; Andreas Mueller; Dirk Beyer
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The increasing demands for registration metrology for repeatability, accuracy, and resolution in order to be able to perform measurements in the active area on production features have prompted the development of PROVETM, the nextgeneration registration metrology tool that utilizes 193nm illumination and a metrology stage that is actively controlled in all six degrees of freedom. PROVETM addresses full in-die capability for double patterning lithography and sophisticated inverse-lithography schemes. Innovative approaches for image analysis, such as 2D correlation, have been developed to achieve this demanding goal. In order to take full advantage of the PROVETM resolution and measurement capabilities, a direct link to the mask data preparation for job automation and marker identification is inevitable. This paper describes an integrated solution using Synopsys' CATSR for extracting and preparing tool-specific job input data for PROVE. In addition to the standard marking functionalities, CATSR supports the 2D correlation method by providing reference clips in OASIS.MASK format.

Paper Details

Date Published: 20 May 2011
PDF: 9 pages
Proc. SPIE 8081, Photomask and Next-Generation Lithography Mask Technology XVIII, 80810L (20 May 2011); doi: 10.1117/12.899779
Show Author Affiliations
Ronald J. Lesnick, Synopsys, Inc. (United States)
Stephen Kim, Synopsys, Inc. (United States)
Matthias Waechter, Carl Zeiss SMS GmbH (Germany)
Dirk Seidel, Carl Zeiss SMS GmbH (Germany)
Andreas Mueller, Carl Zeiss SMS GmbH (Germany)
Dirk Beyer, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 8081:
Photomask and Next-Generation Lithography Mask Technology XVIII
Toshio Konishi, Editor(s)

© SPIE. Terms of Use
Back to Top