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Proceedings Paper

EQ-10 electrodeless Z-pinch EUV source for metrology applications
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Paper Abstract

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Paper Details

Date Published: 13 October 2011
PDF: 14 pages
Proc. SPIE 8166, Photomask Technology 2011, 81662U (13 October 2011); doi: 10.1117/12.899141
Show Author Affiliations
Deborah Gustafson, Energetiq Technology, Inc. (United States)
Stephen F. Horne, Energetiq Technology, Inc. (United States)
Matthew J. Partlow, Energetiq Technology, Inc. (United States)
Matthew M. Besen, Energetiq Technology, Inc. (United States)
Donald K. Smith, Energetiq Technology, Inc. (United States)
Paul A. Blackborow, Energetiq Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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