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Proceedings Paper

Laser damage threshold results for sputtered coatings produced using different deposition technologies
Author(s): Peter MacKay; Steve Wakeham; Mike Wilde; James Dutson; John Allen
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Paper Abstract

A new sputter deposition process has been developed based upon remote generation of plasma by a dedicated Plasma Source (PLS). This technique is referred to as high target utilisation sputtering (HiTUS). In contrast to ion beam and magnetron sputtering processes, HiTUS allows fast deposition rates of low stress, high density films from a high percentage (>90%) of the target surface. The process has not previously been applied to thin films for high laser damage threshold applications. The paper will present results of the anti-reflection (AR) coating trials and compare them to two other coating deposition processes - standard e-beam evaporation and hollow cathode ion-assisted e-beam deposition.

Paper Details

Date Published: 22 November 2011
PDF: 9 pages
Proc. SPIE 8190, Laser-Induced Damage in Optical Materials: 2011, 819006 (22 November 2011); doi: 10.1117/12.899118
Show Author Affiliations
Peter MacKay, Gooch & Housego Ltd. (United Kingdom)
Steve Wakeham, Plasma Quest Ltd. (United Kingdom)
Mike Wilde, Gooch & Housego Ltd. (United Kingdom)
James Dutson, Plasma Quest Ltd. (United Kingdom)
John Allen, AJ Thin Films Consultancy Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 8190:
Laser-Induced Damage in Optical Materials: 2011
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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