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Proceedings Paper

Attenuated phase-shift mask with high tolerance for 193nm radiation damage
Author(s): Taichi Yamazaki; Ryohei Gorai; Yosuke Kojima; Takashi Haraguchi; Tsuyoshi Tanaka; Ryuji Koitabashi; Yukio Inazuki; Hiroki Yoshikawa
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Paper Abstract

In the semiconductor technology using the 193nm ArF excimer laser, the problem of radiation damage on photomask becomes more serious. This phenomenon is regarded as serious issue for semiconductor device fabrication. Some approaches have been tried to prevent the radiation damage. One of reports indicates that the radiation damage can be reduced by using an exposure tool with ultra clean extreme dry air [1]. However, it is difficult to adopt dry air into all exposure tools due to high cost. In our previous work, two facts were ascertained; radiation damage is caused by MoSi film oxidation, and depends on MoSi film composition [2]. In this paper, radiation damage was tried to decrease by MoSi film modification of att. PSM. MoSi film composition for PSM is optimized in consideration of cleaning durability, mask defect repair and processability. The new PSM is named AID (Anti Irradiation Damage). Radiation damage of AID PSM can be improved by 40[%] from conventional PSM. Cleaning durability can be also improved by AID PSM. The other evaluation items such as CD performance, cross section, defect level and repair, are equal between the AID PSM and conventional one. Additionally, the lithography performances by simulation of AID PSM are equivalent with that of conventional PSM. Therefore, it can be expected that there is no difficulty in converting conventional PSM into AID PSM. From these evaluation results, development of AID PSM was completed, and preparation for production is now going.

Paper Details

Date Published: 14 October 2011
PDF: 11 pages
Proc. SPIE 8166, Photomask Technology 2011, 81663V (14 October 2011); doi: 10.1117/12.898984
Show Author Affiliations
Taichi Yamazaki, Toppan Printing Co., Ltd. (Japan)
Ryohei Gorai, Toppan Printing Co., Ltd. (Japan)
Yosuke Kojima, Toppan Printing Co., Ltd. (Japan)
Takashi Haraguchi, Toppan Printing Co., Ltd. (Japan)
Tsuyoshi Tanaka, Toppan Printing Co., Ltd. (Japan)
Ryuji Koitabashi, Shin-Etsu Chemical Co., Ltd. (Japan)
Yukio Inazuki, Shin-Etsu Chemical Co., Ltd. (Japan)
Hiroki Yoshikawa, Shin-Etsu Chemical Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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