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Proceedings Paper

Optical system to extract reflection coefficients and optical admittances of a thin film stack and its application in coating monitoring
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Paper Abstract

An optical system to extract the reflection coefficient and optical admittance of film stack is presented. Both reflection phase and reflection magnitude intensity from the tested film stack were measured under normal incidence of the light. Two dimensional refractive index and thickness distribution of each layer in multilayer thin films can be obtained by the analysis of the reflection coefficients or optical admittance of multi-wavelengths. A novel monitoring method for the thin film deposition using the reflection coefficient and optical admittance loci as the thickness grows is also proposed to achieve better performance in this article.

Paper Details

Date Published: 1 October 2011
PDF: 6 pages
Proc. SPIE 8172, Optical Complex Systems: OCS11, 81721D (1 October 2011); doi: 10.1117/12.898963
Show Author Affiliations
Cheng-Chung Lee, National Central Univ. (Taiwan)
Kai Wu, National Central Univ. (Taiwan)
Yu-Jen Chen, National Central Univ. (Taiwan)
Chien-Cheng Kuo, National Central Univ. (Taiwan)


Published in SPIE Proceedings Vol. 8172:
Optical Complex Systems: OCS11
Gérard Berginc, Editor(s)

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