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Proceedings Paper

Double patterning from design enablement to verification
Author(s): David Abercrombie; Pat Lacour; Omar El-Sewefy; Alex Volkov; Evgueni Levine; Kellen Arb; Chris Reid; Qiao Li; Pradiptya Ghosh
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Paper Abstract

Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions. ○ We examine DP design methodologies, current DP conflict feedback mechanisms, and how they can help designers identify and resolve conflicts. ○ In place and route (P&R), the placement engine must now be aware of the assumptions made during IP cell design, and use placement directives provide by the library designer. We examine the new effects DP introduces in detail routing, discuss how multiple choices of LELE and the cut allowances can lead to different solutions, and describe new capabilities required by detail routers and P&R engines. ○ We discuss why LELE DP cuts and overlaps are critical to optical process correction (OPC), and how a hybrid mechanism of rule and model-based overlap generation can provide a fast and effective solution. ○ With two litho-etch steps, mask misalignment and image rounding are now verification considerations. We present enhancements to the OPCVerify engine that check for pinching and bridging in the presence of DP overlay errors and acute angles.

Paper Details

Date Published: 13 October 2011
PDF: 14 pages
Proc. SPIE 8166, Photomask Technology 2011, 81660X (13 October 2011); doi: 10.1117/12.898895
Show Author Affiliations
David Abercrombie, Mentor Graphics Corp. (United States)
Pat Lacour, Mentor Graphics Corp. (United States)
Omar El-Sewefy, Mentor Graphics Corp. (Egypt)
Alex Volkov, Mentor Graphics Corp. (United States)
Evgueni Levine, Mentor Graphics Corp. (United States)
Kellen Arb, Mentor Graphics Corp. (United States)
Chris Reid, Mentor Graphics Corp. (United States)
Qiao Li, Mentor Graphics Corp. (United States)
Pradiptya Ghosh, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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