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Proceedings Paper

Enhancement of global CD correction and data processing in EB mask writer EBM-8000
Author(s): Hiroshi Matsumoto; Yasuo Kato; Tomoo Motosugi; Jun Yashima; Takayuki Abe; Noriaki Nakayamada; Shusuke Yoshitake; Kiyoshi Hattori
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Paper Abstract

We report our development of fogging effect correction method aimed for EBM-8000, our newest series of EB mask writers for mask production of 22nm half-pitch generation and for mask development of 16nm half-pitch generation. We refined the method of fogging effect correction by taking account of dose modulation for proximity effects correction and loading effect correction into fogging effect correction, greatly reducing theoretical error. Writing experiment has shown that our method based on the threshold dose model is effective, though deviation from the model is observed.

Paper Details

Date Published: 13 October 2011
PDF: 10 pages
Proc. SPIE 8166, Photomask Technology 2011, 816620 (13 October 2011); doi: 10.1117/12.898846
Show Author Affiliations
Hiroshi Matsumoto, NuFlare Technology, Inc. (Japan)
Yasuo Kato, NuFlare Technology, Inc. (Japan)
Tomoo Motosugi, NuFlare Technology, Inc. (Japan)
Jun Yashima, NuFlare Technology, Inc. (Japan)
Takayuki Abe, NuFlare Technology, Inc. (Japan)
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Shusuke Yoshitake, NuFlare Technology, Inc. (Japan)
Kiyoshi Hattori, NuFlare Technology, Inc. (Japan)

Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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