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Proceedings Paper

30nm full field quartz template replicated from Si master for FLASH active layer NIL
Author(s): Duhyun Lee; Byung-Kyu Lee; Woong Ko; Jae-Kwan Kim; Kiyeon Yang; Byounghoon Seung; Ilyong Jang; Mun Ja Kim; Byunggook Kim; ChangMin Park; Jeongho Yeo; Changyoul Moon
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Paper Abstract

38nm half pitch pattern was replicated from Si master pattern to quartz blank template. It is a novel approach different from typical quartz to quartz replication. This replication concept is expected to alleviate the burden not only in cost but also resolution for NIL template fabrication. In this study, full field Si master fabricated by ArF immersion lithography, UV-transparent hard mask for quartz blank template and core-out quartz blank template were applied to prove the concept. And the replica template was evaluated with NIL and subsequent etching.

Paper Details

Date Published: 13 October 2011
PDF: 7 pages
Proc. SPIE 8166, Photomask Technology 2011, 81661U (13 October 2011); doi: 10.1117/12.898747
Show Author Affiliations
Duhyun Lee, SAMSUNG Advanced Institute of Technology (Korea, Republic of)
Byung-Kyu Lee, SAMSUNG Advanced Institute of Technology (Korea, Republic of)
Woong Ko, SAMSUNG Advanced Institute of Technology (Korea, Republic of)
Jae-Kwan Kim, SAMSUNG Advanced Institute of Technology (Korea, Republic of)
Kiyeon Yang, SAMSUNG Advanced Institute of Technology (Korea, Republic of)
Byounghoon Seung, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ilyong Jang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Mun Ja Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byunggook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
ChangMin Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeongho Yeo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Changyoul Moon, SAMSUNG Advanced Institute of Technology (Korea, Republic of)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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