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Proceedings Paper

Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine
Author(s): Dragan Stojcevski; Michel Lequime; Grégory Chauveau; Didier Torricini; Catherine Grèzes-Besset
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Paper Abstract

In the field of optical coatings production, in situ determination of thin films properties during deposition process is a key point for the achievement of high performance filters. Using a spectral measurement over a wide range is a way to improve the robustness of the reverse engineering methods implemented for the monitoring of thin film thickness and the in-situ determination of material refractive index. In the framework of the development of a magnetron sputtering deposition machine for 2-meter optics driven by CILAS, the Optical Thin-Film Research group of Institut Fresnel has designed and qualified a dedicated Broadband Optical Monitoring covering the visible and near infrared spectral range from 280 nm to 2 200 nm. An all-fibered system, well adapted to the extremely large size of the machine, is used to select the location of the measurement point inside the vacuum chamber (among 9 possible). Moreover, this system allows to achieve uniformity studies at the surface of large size substrates along a straight line perpendicular to the cathode main axis with the help of the motorized displacement system of the substrate in front of the magnetron cathodes. A real-time monitoring of the physical thickness is thus done offering possibilities for automatic deposition process and in-line design re-optimization.

Paper Details

Date Published: 3 October 2011
PDF: 7 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681G (3 October 2011); doi: 10.1117/12.898609
Show Author Affiliations
Dragan Stojcevski, Institut Fresnel, CNRS, Aix-Marseille Univ. (France)
Michel Lequime, Institut Fresnel, CNRS, Aix-Marseille Univ. (France)
Grégory Chauveau, CILAS (France)
Didier Torricini, CILAS (France)
Catherine Grèzes-Besset, CILAS (France)

Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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