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Proceedings Paper

Mask aligner process enhancement by spatial filtering
Author(s): Uwe Vogler; Andreas Bich; Reinhard Voelkel; Lorenz Stuerzebecher; Uwe Zeitner; Michael Hornung
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Paper Abstract

Mask Aligners are used in the Semiconductor Industry to transfer structures with moderate resolution requirements onto substrates. With the casting of the shadow a photochemical reactive resist is exposed. As diffraction appears at the mask structures the exposure wavelength and the proximity gap between mask and wafer influence the quality of the image in the resist. As both parameters are very often not changeable for processes there is a big need to find another way to improve the resist image. In this paper a new approach to enhance the exposure result will be presented. MO Exposure Optics, a novel illumination system for Mask Aligners, uses a combination of two microlens Köhler Integrators. MO Exposure Optics decouples the illumination system in a Mask Aligner from the lamp and ensures a uniform angular spectrum over the whole mask plane. Spatial filtering of the illumination light allows to reduce the diffraction effects at the mask structures and to improve the lithographic process in a Mask Aligner.

Paper Details

Date Published: 21 September 2011
PDF: 8 pages
Proc. SPIE 8170, Illumination Optics II, 81700E (21 September 2011); doi: 10.1117/12.897713
Show Author Affiliations
Uwe Vogler, SUSS MicroOptics SA (Switzerland)
Andreas Bich, SUSS MicroOptics SA (Switzerland)
Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)
Lorenz Stuerzebecher, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Uwe Zeitner, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Michael Hornung, SUSS MicroTec Lithography GmbH (Germany)


Published in SPIE Proceedings Vol. 8170:
Illumination Optics II
Tina E. Kidger; Stuart David, Editor(s)

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