Share Email Print
cover

Proceedings Paper

EB resolution capability with CP exposure
Author(s): Masaki Kurokawa; Hideaki Isobe; Kenji Abe; Yoshihisa Oae; Akio Yamada; Shogo Narukawa; Mikio Ishikawa; Hiroshi Fujita; Morihisa Hoga; Naoya Hayashi
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We are evaluating the resolution capability of character projection (CP) exposure method using a Multi Colum Cell Proof of Concept (MCC-POC) tool. Resolving of 14nm half pitch (HP) 1:1 line and space (LS) patterns are confirmed with fine openings of a DNP fabricated CP mask for 10:1 de-magnification ratio. CP exposure has been proven to exhibit high resolution capabilities even under the most challenging optimization conditions that are required for throughput enhancement. As a result of evaluating the resolution capability of CP technology, it became apparent that the CP technology has strong potentials to meet future challenges in two areas. One is where an increased number of CP with variable illumination technology gives a higher throughput which has been the main objective behind the development of this technology, and the other is to achieve higher resolution capability that is one of the strengths of CP exposure method. We also evaluated the resolution on Quartz mask blanks instead of Si wafers and obtained 18nm HP 1:1 resolution with CP exposure.

Paper Details

Date Published: 22 April 2011
PDF: 10 pages
Proc. SPIE 8081, Photomask and Next-Generation Lithography Mask Technology XVIII, 80810A (22 April 2011); doi: 10.1117/12.897272
Show Author Affiliations
Masaki Kurokawa, Advantest Corp. (Japan)
Hideaki Isobe, Advantest Corp. (Japan)
Kenji Abe, Advantest Corp. (Japan)
Yoshihisa Oae, Advantest Corp. (Japan)
Akio Yamada, Advantest Corp. (Japan)
Shogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Mikio Ishikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 8081:
Photomask and Next-Generation Lithography Mask Technology XVIII
Toshio Konishi, Editor(s)

© SPIE. Terms of Use
Back to Top