Share Email Print
cover

Proceedings Paper

Releasing material screening and continuous nano-imprinting in mold replication for nano-imprint lithography
Author(s): Kouta Suzuki; Hideo Kobayashi; Takashi Sato; Hiroshi Yamashita; Tsuyoshi Watanabe
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Nano-Imprint Lithography and a mold, mold replication from an EB master mold as well, those are essential for a large-scale production of patterned media. In nano-imprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. Those difficulties also work to retard continuous imprinting for the mold replication. Then, we focused on release materials characterization and selection to facilitate clean separation between cured resist and the master. This paper describes a novel release material, and continuous nano-imprinting results with it for replica mold fabrication from an EB master for the patterned media application.

Paper Details

Date Published: 13 October 2011
PDF: 8 pages
Proc. SPIE 8166, Photomask Technology 2011, 81663B (13 October 2011); doi: 10.1117/12.897099
Show Author Affiliations
Kouta Suzuki, HOYA Corp. (Japan)
Hideo Kobayashi, HOYA Corp. (Japan)
Takashi Sato, HOYA Corp. (Japan)
Hiroshi Yamashita, HOYA Corp. (Japan)
Tsuyoshi Watanabe, HOYA Corp. (Japan)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

© SPIE. Terms of Use
Back to Top