Share Email Print

Proceedings Paper

Optimization of mask shot count using MB-MDP and lithography simulation
Author(s): Gek Soon Chua; Wei Long Wang; Byoung IL Choi; Yi Zou; Cyrus Tabery; Ingo Bork; Tam Nguyen; Aki Fujimura
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In order to maintain manageable process windows, mask shapes at the 20nm technology node and below become so complex that mask write times reach 40 hours or might not be writeable at all since the extrapolated write time reaches 80 hours. The recently introduced Model Based Mask Data Preparation (MB-MDP) technique is able to reduce shot count and therefore mask write time by using overlapping shots. Depending on the amount of shot count reduction the contour of the mask shapes is changed leading to the question how the mask contour influences wafer performance. This paper investigates the tradeoff between mask shot count reduction using MB-MDP and wafer performance using lithography simulation. A typical Source-Mask-Optimization (SMO) result for a 20nm technology will be used as an example.

Paper Details

Date Published: 13 October 2011
PDF: 11 pages
Proc. SPIE 8166, Photomask Technology 2011, 816632 (13 October 2011); doi: 10.1117/12.897037
Show Author Affiliations
Gek Soon Chua, GLOBALFOUNDRIES Singapore (Singapore)
Wei Long Wang, GLOBALFOUNDRIES Singapore (Singapore)
Byoung IL Choi, GLOBALFOUNDRIES Singapore (Singapore)
Cyrus Tabery, GLOBALFOUNDRIES USA (United States)
Ingo Bork, D2S, Inc. (United States)
Tam Nguyen, D2S, Inc. (United States)
Aki Fujimura, D2S, Inc. (United States)

Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

© SPIE. Terms of Use
Back to Top