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Proceedings Paper

Investigation of the optical property and structure of WO3 thin films with different sputtering depositions
Author(s): Hsi-Chao Chen; Der-Jun Jan; Chien-Han Chen; Kuo-Ting Huang; Yen-Ming Lo; Sheng-Hui Chen
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Paper Abstract

The purpose of this research was to compare the optical properties and structure of tungsten oxide (WO3) thin films that was deposited by different sputtering depositions. WO3 thin films deposited by two different depositions of direct current (DC) magnetron sputtering and pulsed DC sputtering. A 99.95% WO3 target was used as the starting material for these depositions. These WO3 thin films were deposited on the ITO glass, PET and silicon substrate by different ratios of oxygen and argon. A shadow moiré interferometer would be introduced to measure the residual stress for PET substrate. RF magnetron sputtering had the large residual stress than the other's depositions. A Raman spectrum could exhibit the phase of oxidation of WO3 thin film by different depositions. At the ratio of oxygen and argon was about 1:1, and the WO3 thin films had the best oxidation. However, it was important at the change of the transmittance (ΔT = Tbleached - Tcolored) between the coloring and bleaching for the smart window. Therefore, we also found the WO3 thin films had the large variation of transmittance between the coloring and bleaching at the gas ratios of oxygen and argon of 1:1.

Paper Details

Date Published: 4 October 2011
PDF: 10 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681Z (4 October 2011); doi: 10.1117/12.897017
Show Author Affiliations
Hsi-Chao Chen, National Yunlin Univ. of Science and Technology (Taiwan)
Der-Jun Jan, Institute of Nuclear Energy Research (Taiwan)
Chien-Han Chen, National Yunlin Univ. of Science and Technology (Taiwan)
Kuo-Ting Huang, National Yunlin Univ. of Science and Technology (Taiwan)
Yen-Ming Lo, National Yunlin Univ. of Science and Technology (Taiwan)
Sheng-Hui Chen, National Central Univ. (Taiwan)


Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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