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Proceedings Paper

High speed mask inspection data prep flow based on pipelining
Author(s): Dan Hung; Domingo Morales; Juan Pablo Canepa; Stephen Kim; Po Liu; Jean-Paul Sier; Patrick LoPresti
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Paper Abstract

Mask manufacturers are continuously challenged as a result of the explosive growth in mask pattern data volume. This paper presents a new pipelined approach to mask data preparation for inspection that significantly reduces the data preparation times compared to the conventional flows used today. The focus of this approach minimizes I/O bottlenecks and allows for higher throughput on computer clusters. This solution is optimized for the industry standard OASIS.MASK format. These enhancements in the data processing flow, along with optimizations in the data preparation system architecture, offer a more efficient and highly scalable solution for mask inspection data preparation.

Paper Details

Date Published: 14 October 2011
PDF: 8 pages
Proc. SPIE 8166, Photomask Technology 2011, 81660R (14 October 2011); doi: 10.1117/12.896964
Show Author Affiliations
Dan Hung, Synopsys, Inc. (United States)
Domingo Morales, Synopsys, Inc. (United States)
Juan Pablo Canepa, Synopsys, Inc. (United States)
Stephen Kim, Synopsys, Inc. (United States)
Po Liu, KLA-Tencor Corp. (United States)
Jean-Paul Sier, KLA-Tencor Corp. (United States)
Patrick LoPresti, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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