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Proceedings Paper

YieldStar: a new metrology platform for advanced lithography control
Author(s): Jos Maas; Martin Ebert; Kaustuve Bhattacharyya; Hugo Cramer; Arthur Becht; Stefan Keij; Reinder Plug; Andreas Fuchs; Michael Kubis; Tom Hoogenboom; Vidya Vaenkatesan
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Paper Abstract

As leading edge lithography is moving to 2x-nm design rules, lithography control complements resolution as one of the main drivers and enablers to meet the very stringent overlay, focus and CD requirements. As part of ASML's holistic lithography roadmap, ASML is developing several application-specific optimization and control applications, such as LithoTuner Pattern Matcher and BaseLiner. These applications are all explicitly designed to improve the scanner process window (overlay, focus, CDU and matching). All these applications have in common that they require vast amounts of precise, accurate and process robust wafer data (either taken on product stacks or on so-called monitor wafers). To provide such essential data in a cost-effective manner, ASML developed a metrology platform, called YieldStar. This platform is based on an angle-resolved high-NA scatterometer. It is versatile, as YieldStar's sensor can measure overlay, CD and focus in a single measurement. Thanks to its high speed, large amounts of measurements can be quickly collected. In this paper the latest generation YieldStar is presented, the so-called 200 platform. This YieldStar 200 can be used in a stand-alone configuration (S-200) or as an integrated module in a lithography track (T-200). First overlay results show good TMU results without comprising speed. Furthermore, data is shown that demonstrate YieldStar's capability to reconstruct 3D CD patterns as well.

Paper Details

Date Published: 2 April 2011
PDF: 10 pages
Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850H (2 April 2011); doi: 10.1117/12.896902
Show Author Affiliations
Jos Maas, ASML Netherlands B.V. (Netherlands)
Martin Ebert, ASML Netherlands B.V. (Netherlands)
Kaustuve Bhattacharyya, ASML Netherlands B.V. (Netherlands)
Hugo Cramer, ASML Netherlands B.V. (Netherlands)
Arthur Becht, ASML Netherlands B.V. (Netherlands)
Stefan Keij, ASML Netherlands B.V. (Netherlands)
Reinder Plug, ASML Netherlands B.V. (Netherlands)
Andreas Fuchs, ASML Netherlands B.V. (Netherlands)
Michael Kubis, ASML Netherlands B.V. (Netherlands)
Tom Hoogenboom, ASML Netherlands B.V. (Netherlands)
Vidya Vaenkatesan, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 7985:
27th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)

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