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Proceedings Paper

Roughness characterization of large EUV mirror optics by laser light scattering
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Paper Abstract

Optical components for extreme ultraviolet (EUV) lithography at a wavelength of 13.5 nm face tremendous requirements on the surface finish, because large amounts of the EUV light are lost as a result of roughness-induced scattering. In this paper we present a novel approach for the roughness characterization of large EUV mirror optics based on light scattering measurements at a wavelength of 442 nm. The high sensitivity to roughness and the robustness of this method are exemplified for a 660 mm diameter collector mirror substrate. Area covering images of the high-spatial frequency roughness are retrieved which enable a detailed prediction of the EUV reflectance prior to coating. The results are compared to EUV reflectance measurements after coating.

Paper Details

Date Published: 30 September 2011
PDF: 6 pages
Proc. SPIE 8169, Optical Fabrication, Testing, and Metrology IV, 81690P (30 September 2011); doi: 10.1117/12.896792
Show Author Affiliations
Marcus Trost, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Friedrich-Schiller-Univ. Jena (Germany)
Sven Schröder, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Torsten Feigl, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Angela Duparré, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Andreas Tünnermann, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 8169:
Optical Fabrication, Testing, and Metrology IV
Angela Duparré; Roland Geyl, Editor(s)

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