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Proceedings Paper

Interface plasmonic properties of silver coated by ultrathin metal oxides
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Paper Abstract

Many fields of high technology take advantage of conductor-dielectric interface properties. Deeper knowledge of physical processes that determine the optical response of the structures containing metal-dielectric interfaces is important for improving the performance of thin film devices containing such materials. Here we present a study on optical properties of several ultrathin metal oxides deposited over thin silver layers. Some widely used materials (Al2O3, SiO2, Y2O3, HfO2) were selected for deposition by r.f. sputtering, and the created metal-dielectric structures with two of them, alumina and silica, were investigated in this work using attenuated total reflectance (ATR) technique and by variable-angle spectroscopic ellipsometry (VASE). VASE was performed with a help of a commercial ellipsometer at various incident angles and in a wide spectral range. A home-made sample holder manufactured for WVASE ellipsometer and operational in Otto configuration has been implemented for angle-resolved and spectral ATR measurements. Simultaneous analysis of data obtained by these two independent techniques allows elaboration of a representative model for plasmonic-related phenomena at metal-dielectric interface. The optical constants of the interface layers formed between metal and ultrathin oxide layers are investigated. A series of oxides chosen for this study allows a comparative analysis aimed for selection of the most appropriate materials for different applications.

Paper Details

Date Published: 3 October 2011
PDF: 6 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681V (3 October 2011); doi: 10.1117/12.896769
Show Author Affiliations
A. Sytchkova, ENEA (Italy)
D. Zola, ENEA (Italy)
M. L. Grilli, ENEA (Italy)
A. Piegari, ENEA (Italy)
M. Fang, Shanghai Institute of Optics and Fine Mechanics (China)
H. He, Shanghai Institute of Optics and Fine Mechanics (China)
J. Shao, Shanghai Institute of Optics and Fine Mechanics (China)

Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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