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Proceedings Paper

Fabrication of bilayer wire grid polarizer using replicated polymer nano grating
Author(s): Yunah Han; Jwasun Kim; Euihyeon Byeon; Seok-Min Kim; Yong-ho Lee; Chang Kwon Hwangbo
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Paper Abstract

A bilayer wire grid polarizer composed of UV-replicated nanograting and deposited aluminum layer was designed, fabricated and evaluated for a simpler and less costly reflective polarizer. An electroformed nickel stamp was fabricated using a lithographed photo resist master pattern having a nanograting with a pitch of 80 nm, a line width of 50 nm, and a height of grating of 100 nm. A polymer grating was fabricated by the UV replication process and an aluminum layer with a thickness of 50 nm was deposited by electron-beam evaporation. To examine the performance of the fabricated bilayer wire-grid polarizer, the transmission spectra of TM- and TE-polarized light, and the extinction ratio spectra were measured and compared with the simulated values obtained from the rigorous coupled wave analysis. The measured TMtransmittance and extinction ratio of the fabricated bilayer wire grid polarizer were ~ 40 % and ~ 103 in whole visible ranges, respectively.

Paper Details

Date Published: 22 September 2011
PDF: 6 pages
Proc. SPIE 8169, Optical Fabrication, Testing, and Metrology IV, 81690H (22 September 2011); doi: 10.1117/12.896756
Show Author Affiliations
Yunah Han, Chung-Ang Univ. (Korea, Republic of)
Jwasun Kim, Chung-Ang Univ. (Korea, Republic of)
Euihyeon Byeon, Chung-Ang Univ. (Korea, Republic of)
Seok-Min Kim, Chung-Ang Univ. (Korea, Republic of)
Yong-ho Lee, Inha Univ. (Korea, Republic of)
Chang Kwon Hwangbo, Inha Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8169:
Optical Fabrication, Testing, and Metrology IV
Angela Duparré; Roland Geyl, Editor(s)

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