Share Email Print
cover

Proceedings Paper

Using monodisperse SiO2 microspheres to study laser-induced damage of nodules in HfO2/SiO2 high reflectors
Author(s): Xinbin Cheng; Tao Ding; Wenyan He; Jinlong Zhang; Hongfei Jiao; Bin Ma; Zhengxiang Shen; Zhanshan Wang
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Nodules have been proved to play an important role in the activation of laser damage in 1.053 μm HfO2/SiO2 high reflectors. However, some damage test results revealed that the ejection fluences of some big nodules with height around 1 μm were abnormally high. To find the correlation between the surface dimensions of nodules and their susceptibility to nano-second pulsed laser radiation, monodisperse SiO2 microspheres with five different sizes were used to create engineered nodules in 1.053 μm HfO2/SiO2 high reflectors. The defect density of nodules that were created from SiO2 microspheres was purposely controlled to be around 20-40 mm2 and special care was taken to minimize clusters of SiO2 microspheres as less as possible. This enabled us to take a raster scan test and to get the statistical value of ejection fluences of these engineered nodules. The height and width dimensions of the engineered nodules, especially the discontinuity of nodular boundary, were measured by cross-sectioning of nodular defects using a focused ion-beam milling instrument. Based on the above information, the damage test results were interpreted from the aspects of electric field enhancement model and mechanical stability of nodular structures.

Paper Details

Date Published: 5 October 2011
PDF: 6 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 816816 (5 October 2011); doi: 10.1117/12.896733
Show Author Affiliations
Xinbin Cheng, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Tao Ding, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Wenyan He, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Jinlong Zhang, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Hongfei Jiao, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Bin Ma, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Zhengxiang Shen, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)
Zhanshan Wang, Key Lab. of Advanced Micro-structure Materials (China)
Tongji Univ. (China)


Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

© SPIE. Terms of Use
Back to Top