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Proceedings Paper

Dynamic feedback controller for optical proximity correction
Author(s): Ahmed Omran; Jochen Schacht; Jully Pan; Junjiang Lei; Le Hong; Mohamed Al-Imam; Nick Cobb; Regina Shen; Ryan Chou
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Paper Abstract

A dynamic feedback controller for Optical Proximity Correction (OPC) in a random logic layout using ArF immersion Lithography is presented. The OPC convergence, characterized by edge placement error (EPE), is subjected to optimization using optical and resist effects described by calibrated models (Calibre® nmOPC simulation platform). By memorizing the EPE and Displacement of each fragment from the preceding OPC iteration, a dynamic feedback controller scheme is implemented to achieve OPC convergence in fewer iterations. The OPC feedback factor is calculated for each individual fragment taking care of the cross-MEEF (mask error enhancement factor) effects. Due to the very limited additional computational effort and memory consumption, the dynamic feedback controller reduces the overall run time of the OPC compared to a conventional constant feedback factor scheme. In this paper, the dynamic feedback factor algorithm and its implementation, as well as testing results for a random logic layout, are compared and discussed with respect to OPC convergence and performance.

Paper Details

Date Published: 14 October 2011
PDF: 11 pages
Proc. SPIE 8166, Photomask Technology 2011, 81663I (14 October 2011); doi: 10.1117/12.896677
Show Author Affiliations
Ahmed Omran, Mentor Graphics Corp. (Egypt)
Jochen Schacht, Mentor Graphics Corp. (Taiwan)
Jully Pan, Mentor Graphics Corp. (Taiwan)
Junjiang Lei, Mentor Graphics Corp. (United States)
Le Hong, Mentor Graphics Corp. (United States)
Mohamed Al-Imam, Mentor Graphics Corp. (Egypt)
Nick Cobb, Mentor Graphics Corp. (United States)
Regina Shen, Mentor Graphics Corp. (Taiwan)
Ryan Chou, Mentor Graphics Corp. (Taiwan)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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