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Proceedings Paper

EUV reflectivity and stability of tri-component Al-based multilayers
Author(s): E. Meltchakov; A. Ziani; F. Auchere; X. Zhang; M. Roulliay; S. De Rossi; Ch. Bourassin-Bouchet; A. Jérome; F. Bridou; F. Varniere; F. Delmotte
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Paper Abstract

We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.

Paper Details

Date Published: 4 October 2011
PDF: 9 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 816819 (4 October 2011); doi: 10.1117/12.896577
Show Author Affiliations
E. Meltchakov, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
A. Ziani, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
F. Auchere, Institut d'Astrophysique Spatiale (France)
X. Zhang, Institut d'Astrophysique Spatiale (France)
M. Roulliay, Institut des Sciences Moléculaires d'Orsay (France)
S. De Rossi, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
Ch. Bourassin-Bouchet, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
A. Jérome, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
F. Bridou, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
F. Varniere, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
F. Delmotte, Lab. Charles Fabry, Institut d'Optique Graduate School (France)


Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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