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Proceedings Paper

Aluminum based multilayers systems synthesized by ion beam sputtering for extreme UV
Author(s): A. Ziani; F. Delmotte; C. Le Paven-Thivet; E. Meltchakov; F. Bridou; A. Jérome; M. Roulliay; K. Gasc
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Paper Abstract

In this paper, we present the development of Al-based multilayer mirrors for the spectral range [17 nm - 34 nm]. The purpose of presented study is to optimize the deposition of Al-based multilayers by the ion beam sputtering (IBS) technique according to several parameters such as the ion beam current and the angle of inclination of targets, which allowed us to vary the energy of ad-atoms deposited onto a substrate. We expected to achieve good reflectivity values for both two- and three-material stacks: aluminum/molybdenum Al/Mo, aluminum/molybdenum/boron carbide Al/Mo/B4C and aluminum/molybdenum/silicon carbide Al/Mo/SiC. We have undertaken a series of structural and chemical analyses of these systems. We present their optical characteristics in the EUV range.

Paper Details

Date Published: 4 October 2011
PDF: 6 pages
Proc. SPIE 8168, Advances in Optical Thin Films IV, 81681S (4 October 2011); doi: 10.1117/12.896433
Show Author Affiliations
A. Ziani, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
Ctr. National d'Études Spatiales (France)
F. Delmotte, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
C. Le Paven-Thivet, Institut d'Electronique et Télécommunications de Rennes (France)
E. Meltchakov, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
F. Bridou, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
A. Jérome, Lab. Charles Fabry, Institut d'Optique Graduate School (France)
M. Roulliay, Lab. d'Interaction du Rayonnement X, CNRS, Univ. Paris-Sud (France)
K. Gasc, Ctr. National d'Études Spatiales (France)


Published in SPIE Proceedings Vol. 8168:
Advances in Optical Thin Films IV
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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