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Proceedings Paper

eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool
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Paper Abstract

Based on a massively parallel beam writing strategy (BACUS 2010) a mask writer proof-of-concept tool was realized in 2011. The eMET (electron Mask Exposure Tool) POC column is designed to provide ca. 262-thousand (512 x 512) programmable beams of 50 keV energy and 20 nm or 10 nm beam size. The total beam current through the column is up to 1 μA. The eMET POC is equipped with a laser-interferometer controlled stage for exposure of one cm2 test pattern fields on 6" mask blanks. Operating the eMET POC with a stencil plate, first exposure results are presented. The further eMET POC project plan and the roadmap for eMET Alpha, Beta and multi-generational HVM tools are outlined.

Paper Details

Date Published: 14 October 2011
PDF: 7 pages
Proc. SPIE 8166, Photomask Technology 2011, 816622 (14 October 2011); doi: 10.1117/12.895523
Show Author Affiliations
Elmar Platzgummer, IMS Nanofabrication AG (Austria)
Christof Klein, IMS Nanofabrication AG (Austria)
Hans Loeschner, IMS Nanofabrication AG (Austria)


Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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