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Proceedings Paper

Application of nanostructured silicon to manufacturing of solar cells
Author(s): Angelika I. Luchenko; Tetyana Bilyk; Mykola M. Melnichenko; Olexandra M. Shmyryeva; Kateryna Svezhentsova
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Paper Abstract

In the paper the process of controlled formation of nanostructured silicon is demonstrated and the optical performance compared to standard and textured interfaces. The influence of the formation technique type on its structure, photoluminescent and anti-reflecting properties is studied. The layers of nanostructured silicon have been formed on the textured surface of solar cells. It has been demonstrated that the use of nanostructured silicon reduces the anti-reflection coefficient significantly. It is also shown, that the formation of nanostructured silicon on a textured substrate of singlecrystal silicon after formation on them of contact systems results in decrease of consecutive resistance, increase of short circuit current, decrease of shunting resistance and increase of efficiency.

Paper Details

Date Published: 13 September 2011
PDF: 7 pages
Proc. SPIE 8110, Thin Film Solar Technology III, 81100L (13 September 2011); doi: 10.1117/12.895315
Show Author Affiliations
Angelika I. Luchenko, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)
Tetyana Bilyk, Kiev National Technical Univ. (Ukraine)
Mykola M. Melnichenko, National Taras Shevchenko Univ. of Kyiv (Ukraine)
Olexandra M. Shmyryeva, Kiev National Technical Univ. (Ukraine)
Kateryna Svezhentsova, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)

Published in SPIE Proceedings Vol. 8110:
Thin Film Solar Technology III
Louay A. Eldada, Editor(s)

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