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Proceedings Paper

The promise of metamaterials for new applications in optics
Author(s): H. Schweizer; L. Fu; N. Liu; T. Weiss; P. Schau; K. Frenner; W. Osten; H. Giessen
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Paper Abstract

Metallo-dielectric structured materials, or in other words metamaterials (MTM), are in principle a well established composite to improve efficiency, functionality, and weight of micro-wave components. In recent times, it has been demonstrated that the functionalities of metamaterials can be scaled down to optical frequencies by nano structuring techniques. Examples include negative index materials in the near infrared and visible frequency range, cloaking structures, filters, and structures for improved sensing of environmental gases. The physical processes in plasmonic metamaterials depend strongly on the excitation of surface plasmons and the interaction between them. We have learned how to control the plasmon-photon and the plasmon-plasmon interaction for manipulating the electromagnetic response in a metamaterial at wavelengths well below the vacuum wavelength. Many interesting and novel optical applications and devices are expected. For instance sub-wavelength imaging, compact communication devices as polarisation splitters, slow light media structures, compact colour filters, and resonators. All-plasmonic circuits are also the basis for ultra-dense photonic integration not achievable through the conventional optical integration. With examples of several metamaterial structures we try to illustrate the application potential of MTMs and comment on their fabrication feasibility to show whether metamaterials can hold their promise. Their investigation is in any case a rewarding adventure.

Paper Details

Date Published: 8 July 2011
PDF: 15 pages
Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 808302 (8 July 2011); doi: 10.1117/12.895026
Show Author Affiliations
H. Schweizer, Univ. Stuttgart (Germany)
L. Fu, Univ. Stuttgart (Germany)
N. Liu, Lawrence Berkeley National Lab. (Germany)
T. Weiss, Univ. Stuttgart (Germany)
P. Schau, Univ. Stuttgart (Germany)
K. Frenner, Univ. Stuttgart (Germany)
W. Osten, Univ. Stuttgart (Germany)
H. Giessen, Univ. Stuttgart (Germany)


Published in SPIE Proceedings Vol. 8083:
Modeling Aspects in Optical Metrology III
Bernd Bodermann, Editor(s)

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