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Proceedings Paper

Nanoring patterning using surface plasmon assisted photolithography
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Paper Abstract

Achievable resolution of nano-rings, fabricated using commonly employed conventional mask based photolithography, is limited by diffraction of light. In this work conventional photolithography is modified to incorporate the phenomenon of surface plasmons to overcome the diffraction limit and thus to fabricate nano rings. Here, an embedded-amplitude mask based surface plasmon lithography is numerically investigated to conceptalize a noval methodology to fabricate the proposed nano-ring structure. Results of FDTD simulation shows sharp transmission peaks at the hole edges which could be recorded using suitable thinned photoresist to obtain nano ring structures.

Paper Details

Date Published: 26 July 2011
PDF: 8 pages
Proc. SPIE 8001, International Conference on Applications of Optics and Photonics, 80011P (26 July 2011); doi: 10.1117/12.894397
Show Author Affiliations
R. Sidharthan, Nanyang Technological Univ. (Singapore)
K. Sathiyamoorthy, Nanyang Technological Univ. (Singapore)
V. M. Murukeshan, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 8001:
International Conference on Applications of Optics and Photonics
Manuel Filipe Costa, Editor(s)

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