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Proceedings Paper

Optomechanical design of ultrahigh-resolution monochromator and analyzer for inelastic x-ray scattering spectrometer at the advanced photon source
Author(s): D. Shu; S. Stoupin; R. Khachatryan; K. Goetze; T. Roberts; Yu. Shvyd'ko
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Paper Abstract

A prototype of a novel ultrahigh-resolution inelastic x-ray scattering spectrometer has been designed and tested at undulator-based beamline 30-ID, at the Advanced Photon Source (APS), Argonne National Laboratory. This state-of-the-art instrument is designed to meet challenging mechanical and optical specifications for producing ultrahigh-resolution inelastic x-ray scattering spectroscopy data for various scientific applications. The optomechanical design of the ultrahigh-resolution monochromator and analyzer for inelastic x-ray scattering spectrometer as well as the preliminary test results of its precision positioning performance are presented in this paper.

Paper Details

Date Published: 24 September 2011
PDF: 8 pages
Proc. SPIE 8125, Optomechanics 2011: Innovations and Solutions, 812507 (24 September 2011); doi: 10.1117/12.894103
Show Author Affiliations
D. Shu, Argonne National Lab. (United States)
S. Stoupin, Argonne National Lab. (United States)
R. Khachatryan, Argonne National Lab. (United States)
K. Goetze, Argonne National Lab. (United States)
T. Roberts, Argonne National Lab. (United States)
Yu. Shvyd'ko, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 8125:
Optomechanics 2011: Innovations and Solutions
Alson E. Hatheway, Editor(s)

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