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Proceedings Paper

Nested KB mirror fabrication for synchrotron hard x-ray nanofocusing
Author(s): Bing Shi; Wenjun Liu; Jun Qian; Chian Liu; Ruben Khachatryan; Michael Wieczorek; Ali Khounsary; Albert T. Macrander; Paul Zschack; Jonathan Z. Tischler; Gene E. Ice; Lahsen Assoufid
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Paper Abstract

Kirkpatrick-Baez (KB) mirrors consist of two individual mirrors: one vertical focusing mirror and one horizontal mirror at separate positions. Nested (Montel) KB mirrors consist of two mirrors arranged perpendicularly to each other and side-by-side. We report our results from the fabrication and tests of the first set of nested KB mirrors for a synchrotron hard x-ray micro/nano-focusing system. The elliptically shaped nested Platinum KB mirrors include two 40 mm long mirrors fabricated by depositing Platinum on Silicon substrates using the magnetron sputtering technique. Hard x-ray synchrotron tests have been performed at 15 keV and 2D focal spots of approximately 150 nm x 150 nm (FWHM) were achieved from both monochromatic and polychromatic beams at the 34 ID beamline of the Advanced Photon Source (APS) at Argonne National Laboratory. The side-by-side arrangement of nested KB mirrors requires them to have good surfaces and low figure errors at the intersection of the two mirrors' surfaces. It is very challenging to fabricate substrates that fit the nested KB mirror's arrangement and to deposit thin films to ideal elliptical shapes at the edge of the mirrors. Further research and development will be performed in the areas of fabrication and testing with respect to nested KB mirrors used in micro/nano-focusing systems. In particular, substrate processing and deposition techniques should be examined to improve the performance of the mirrors.

Paper Details

Date Published: 28 September 2011
PDF: 7 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 813903 (28 September 2011); doi: 10.1117/12.894101
Show Author Affiliations
Bing Shi, Argonne National Lab. (United States)
Wenjun Liu, Argonne National Lab. (United States)
Jun Qian, Argonne National Lab. (United States)
Chian Liu, Argonne National Lab. (United States)
Ruben Khachatryan, Argonne National Lab. (United States)
Michael Wieczorek, Argonne National Lab. (United States)
Ali Khounsary, Argonne National Lab. (United States)
Albert T. Macrander, Argonne National Lab. (United States)
Paul Zschack, Argonne National Lab. (United States)
Jonathan Z. Tischler, Oak Ridge National Lab. (United States)
Gene E. Ice, Oak Ridge National Lab. (United States)
Lahsen Assoufid, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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