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Proceedings Paper

The effect of surface residual stress on the performance of high quality x-ray mirrors
Author(s): J. Maj; G. Navrotski; X. Huang; L. Assoufid; R. Khachatryan; J. Qian; M. Wieczorek
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Paper Abstract

The use of high quality X-ray mirrors at synchrotron beamlines as low-energy bandpass, harmonic rejection and high heat load optical elements has become routine. Nearly perfect optical surfaces generated on substrates and held in strain-free fixtures are of paramount importance to their success. Production of these mirrors requires extensive care, yet the effect of residual fabrication stress has not been closely studied. This paper examines the effect of surface and near-surface residual stress on the performance of hard X-ray mirrors using topography and X-ray reflectivity techniques. The present approach complements the information provided by standard optical metrology, giving a more comprehensive understanding of polishing induced surface deformation on X-ray reflectivity. This information is invaluable for the characterization of future, coherence preserving optics where scattering and evanescent sub-surface X-ray penetration may impact beam quality.

Paper Details

Date Published: 28 September 2011
PDF: 8 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390X (28 September 2011); doi: 10.1117/12.894082
Show Author Affiliations
J. Maj, Argonne National Lab. (United States)
G. Navrotski, Argonne National Lab. (United States)
X. Huang, Argonne National Lab. (United States)
L. Assoufid, Argonne National Lab. (United States)
R. Khachatryan, Argonne National Lab. (United States)
J. Qian, Argonne National Lab. (United States)
M. Wieczorek, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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