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Proceedings Paper

Advanced holographic methods in extreme ultraviolet interference lithography
Author(s): Bernd Terhalle; Andreas Langner; Birgit Päivänranta; Yasin Ekinci
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Paper Abstract

We study the formation of complex pattern geometries and beam shapes in diffraction-based extreme ultraviolet interference lithography. In particular, we demonstrate numerically as well as experimentally the potential of interfering multiple beams with well-controlled relative phase relations for the fabrication of high resolution periodic and quasiperiodic nanostructures.

Paper Details

Date Published: 23 September 2011
PDF: 7 pages
Proc. SPIE 8102, Nanoengineering: Fabrication, Properties, Optics, and Devices VIII, 81020V (23 September 2011); doi: 10.1117/12.893733
Show Author Affiliations
Bernd Terhalle, Paul Scherrer Institut (Switzerland)
Andreas Langner, Paul Scherrer Institut (Switzerland)
Birgit Päivänranta, Paul Scherrer Institut (Switzerland)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)
ETH Zürich (Switzerland)


Published in SPIE Proceedings Vol. 8102:
Nanoengineering: Fabrication, Properties, Optics, and Devices VIII
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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