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Proceedings Paper

Enhanced nonlinear optics in resonant GaAs gratings: harmonic generation and optical bistability
Author(s): D. de Ceglia; G. D'Aguanno; N. Mattiucci; M. A. Vincenti; M. J. Bloemer; M. Scalora
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Paper Abstract

We present a study on nonlinear optical processes in GaAs gratings, made by perforating a single layer of GaAs with very narrow slits. Large enhancement of conversion efficiency, for both second and third harmonic generation, is predicted when a TE-polarized pump field excites the guided mode resonances of the grating. At the onset of these modes the spectrum near the pump wavelength shows abrupt changes of linear transmission and reflection that follow a typical Fano-like shape. Under these circumstances, the grating provides dramatic enhancement of local fields and fosters favorable conditions for harmonic generation processes, even in regimes of strong linear absorption at the harmonic wavelengths. In a GaAs grating pumped at 1064nm, we predict second (532nm) and third (354nm) harmonic conversion efficiencies several orders of magnitude larger than conversion rates achievable in either bulk or etalon structures made of the same material. These efficiencies are not influenced by linear absorption, and they are unrelated to grating thickness. We discuss the influence of self-phase modulation on the harmonic generation conversion efficiencies. Finally, we also analyze self phase modulation effects on resonant gratings tuning the input signal at guided mode resonances, demonstrating the possibility of triggering optical bistability at relatively low switching intensities.

Paper Details

Date Published: 9 September 2011
PDF: 6 pages
Proc. SPIE 8093, Metamaterials: Fundamentals and Applications IV, 80932D (9 September 2011); doi: 10.1117/12.893696
Show Author Affiliations
D. de Ceglia, The AEgis Technologies Group, Inc. (United States)
G. D'Aguanno, The AEgis Technologies Group, Inc. (United States)
N. Mattiucci, The AEgis Technologies Group, Inc. (United States)
M. A. Vincenti, The AEgis Technologies Group, Inc. (United States)
M. J. Bloemer, U.S. Army Aviation and Missile Command (United States)
M. Scalora, U.S. Army Aviation and Missile Command (United States)


Published in SPIE Proceedings Vol. 8093:
Metamaterials: Fundamentals and Applications IV
Allan D. Boardman; Nader Engheta; Mikhail A. Noginov; Nikolay I. Zheludev, Editor(s)

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