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Proceedings Paper

Circularly polarized high order harmonics in the EUV photon energy range: toward table-top nanometric magnetic imaging
Author(s): Boris Vodungbo; A. Barszczak Sardinha; Julien Gautier; Guillaume Lambert; Stéphane Sebban; Jan Lüning; Philippe Zeitoun
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Paper Abstract

Circularly polarized high order harmonics in the extreme ultraviolet range (18 - 27 nm) have been obtained by a two steps process. Harmonics were generated from a linearly polarized infrared laser (40 fs, 0.25 TW) focused into a neon filled gas cell. The harmonics have then been circularly polarized by a four-reflector phase-shifter. The polarization of the harmonics have been measured using a rotating multilayer broadband mirror set at an incidence angle of 45°. Fully circularly polarized radiation has been obtained with an efficiency of a few percents. This is significantly more efficient than currently demonstrated direct generation of elliptically polarized harmonics. This demonstration opens up new experimental capabilities based on high order harmonics, for example, in materials science for time-resolved nanometric magnetic imaging.

Paper Details

Date Published: 5 October 2011
PDF: 11 pages
Proc. SPIE 8140, X-ray Lasers and Coherent X-ray Sources: Development and Applications IX, 81400D (5 October 2011); doi: 10.1117/12.893603
Show Author Affiliations
Boris Vodungbo, Lab. d'Optique Appliquée, CNRS, École Polytechnique ParisTech (France)
A. Barszczak Sardinha, Lab. d'Optique Appliquée, CNRS, École Polytechnique ParisTech (France)
Julien Gautier, Lab. d'Optique Appliquée, CNRS, École Polytechnique ParisTech (France)
Guillaume Lambert, Lab. d'Optique Appliquée, CNRS, École Polytechnique ParisTech (France)
Stéphane Sebban, Lab. d'Optique Appliquée, CNRS, École Polytechnique ParisTech (France)
Jan Lüning, Lab de Chimie Physique, CNRS, Univ. Pierre et Marie Curie (France)
Philippe Zeitoun, Lab. d'Optique Appliquée, CNRS, École Polytechnique ParisTech (France)


Published in SPIE Proceedings Vol. 8140:
X-ray Lasers and Coherent X-ray Sources: Development and Applications IX
James Dunn; Annie Klisnick, Editor(s)

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