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Proceedings Paper

Verification of scatterometer design
Author(s): Wenjing Zhao; Cornelius Hahlweg; Hendrik Rothe
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Paper Abstract

Scatterometric applications demand strategies for the selection from the various basic scatterometer principles as well as detailed design rules to fit the final optical instrument, the data processing and user interface into the requirements of the application in scope. In recent years we proposed methods based on the optical properties of various basic measurement structures to support the synthesis process for scatterometers, including the decision for the structure itself. In continuation of last years paper on design rules for catadioptric scatterometers the present paper is dedicated to the metrological verification of the proposed design methods for devices with elliptical mirrors in off-axis alignment. Further questions of data processing and analysis, especially the necessary coordinate transformations and calibration procedures will be discussed, practical examples included.

Paper Details

Date Published: 20 September 2011
PDF: 7 pages
Proc. SPIE 8105, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V, 810509 (20 September 2011); doi: 10.1117/12.893511
Show Author Affiliations
Wenjing Zhao, Helmut Schmidt Univ. (Germany)
Cornelius Hahlweg, Helmut Schmidt Univ. (Germany)
Hendrik Rothe, Helmut Schmidt Univ. (Germany)


Published in SPIE Proceedings Vol. 8105:
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
Michael T. Postek, Editor(s)

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