Share Email Print

Proceedings Paper

Characterization of a 20-nm hard x-ray focus by ptychographic coherent diffractive imaging
Author(s): Joan Vila-Comamala; Ana Diaz; Manuel Guizar-Sicairos; Sergey Gorelick; Vitaliy A. Guzenko; Petri Karvinen; Cameron M. Kewish; Elina Färm; Mikko Ritala; Alexandre Mantion; Oliver Bunk; Andreas Menzel; Christian David
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Recent advances in the fabrication of diffractive X-ray optics have boosted hard X-ray microscopy into spatial resolutions of 30 nm and below. Here, we demonstrate the fabrication of zone-doubled Fresnel zone plates for multi-keV photon energies (4-12 keV) with outermost zone widths down to 20 nm. However, the characterization of such elements is not straightforward using conventional methods such as knife edge scans on well-characterized test objects. To overcome this limitation, we have used ptychographic coherent diffractive imaging to characterize a 20 nm-wide X-ray focus produced by a zone-doubled Fresnel zone plate at a photon energy of 6.2 keV. An ordinary scanning transmission X-ray microscope was modified to acquire the ptychographic data from a strongly scattering test object. The ptychographic algorithms allowed for the reconstruction of the image of the test object as well as for the reconstruction of the focused hard X-ray beam waist, with high spatial resolution and dynamic range. This method yields a full description of the focusing performance of the Fresnel zone plate and we demonstrate the usefulness ptychographic coherent diffractive imaging for metrology and alignment of nanofocusing diffractive X-ray lenses.

Paper Details

Date Published: 28 September 2011
PDF: 7 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390E (28 September 2011); doi: 10.1117/12.893235
Show Author Affiliations
Joan Vila-Comamala, Paul Scherrer Institut (Switzerland)
Ana Diaz, Paul Scherrer Institut (Switzerland)
Manuel Guizar-Sicairos, Paul Scherrer Institut (Switzerland)
Sergey Gorelick, Paul Scherrer Institut (Switzerland)
Vitaliy A. Guzenko, Paul Scherrer Institut (Switzerland)
Petri Karvinen, Paul Scherrer Institut (Switzerland)
Cameron M. Kewish, Synchrotron SOLEIL (France)
Elina Färm, Univ. of Helsinki (Finland)
Mikko Ritala, Univ. of Helsinki (Finland)
Alexandre Mantion, Bundesanstalt für Materialforschung und -prüfung (Germany)
Oliver Bunk, Paul Scherrer Institut (Switzerland)
Andreas Menzel, Paul Scherrer Institut (Switzerland)
Christian David, Paul Scherrer Institut (Switzerland)

Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

© SPIE. Terms of Use
Back to Top