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Proceedings Paper

Shorter wavelength EUV source around 6.X nm by rare-earth plasma
Author(s): Takamitsu Otsuka; Deirdre Kilbane; Thomas Cummins; Colm O'Gorman; Padraig Dunne; Gerry O'Sullivan; Weihua Jiang; Akira Endo; Takeshi Higashiguchi; Noboru Yugami
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Paper Abstract

We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5-6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B4C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission. We also have investigated the dependence of the spectral behavior and conversion efficiencies of rare-earth plasma extreme ultraviolet sources with peak emission at 6.7 nm on laser wavelength and the initial target density. The maximum conversion efficiency was 1.3% at a laser intensity of 1.6 × 1012 W/cm2 at an operating wavelength of 1064 nm, when self-absorption was reduced by use of a low initial density target.

Paper Details

Date Published: 28 September 2011
PDF: 10 pages
Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390T (28 September 2011); doi: 10.1117/12.892897
Show Author Affiliations
Takamitsu Otsuka, Utsunomiya Univ. (Japan)
Deirdre Kilbane, Univ. College Dublin (Ireland)
Thomas Cummins, Univ. College Dublin (Ireland)
Colm O'Gorman, Univ. College Dublin (Ireland)
Padraig Dunne, Univ. College Dublin (Ireland)
Gerry O'Sullivan, Univ. College Dublin (Ireland)
Weihua Jiang, Nagaoka Univ. of Technology (Japan)
Akira Endo, Waseda Univ. (Japan)
Takeshi Higashiguchi, Utsunomiya Univ. (Japan)
Japan Sciene and Technology Agency, CREST (Japan)
Noboru Yugami, Utsunomiya Univ. (Japan)
Japan Sciene and Technology Agency, CREST (Japan)


Published in SPIE Proceedings Vol. 8139:
Advances in X-Ray/EUV Optics and Components VI
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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